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Boron‐compensation effect on hydrogenated amorphous silicon with oxygen and nitrogen impurities

 

作者: Masao Isomura,   Toshihiro Kinoshita,   Shinya Tsuda,  

 

期刊: Applied Physics Letters  (AIP Available online 1996)
卷期: Volume 68, issue 9  

页码: 1201-1203

 

ISSN:0003-6951

 

年代: 1996

 

DOI:10.1063/1.115968

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Oxygen and nitrogen impurities increase the dark conductivity of hydrogenated amorphous silicon (a‐Si:H), due to their donorlike behavior. An appropriate amount of boron doping recovers these values to the original ones unless the effect of band gap widening appears. The midgap absorption spectra of the compensateda‐Si:H are identical to those of intrinsica‐Si:H both at initial and light‐soaked states. The major effect of the oxygen and nitrogen is the creation of donors, which show a similar behavior to those by phosphorus—only a small fraction of the oxygen and nitrogen produces donors, the rest is included in thea‐Si:H network without causing any other significant effect until alloying effects appear. ©1996 American Institute of Physics.

 

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