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Hydrothermal epitaxy of highly oriented TiO2thin films on silicon

 

作者: Qianwang Chen,   Yitai Qian,   Zuyao Chen,   Wenbin Wu,   Zhiwen Chen,   Guien Zhou,   Yuheng Zhang,  

 

期刊: Applied Physics Letters  （AIP Available online 1995）
卷期: Volume 66, issue 13  

页码: 1608-1610

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.113867

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Highly oriented thin films (0.15 &mgr;m) of titania on Si (100) substrates have been prepared first by hydrothermal treatment of TiO42−solution (0.6–1.2M) at relatively low temperatures. Films made at 100–200 °C contain only the anatase phase with (112) orientation, adhere well to the substrates. The hydrothermal temperature, time, and thepH value of TiO42−solution are the critical parameters determining the formation of films. ©1995 American Institute of Physics. 

 

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