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Implantation of dopants into indium phosphide

 

作者: Carl R. Zeisse,   Robert G. Wilson,   Craig G. Hopkins,  

 

期刊: Journal of Applied Physics  (AIP Available online 1985)
卷期: Volume 57, issue 5  

页码: 1656-1660

 

ISSN:0021-8979

 

年代: 1985

 

DOI:10.1063/1.334432

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Seven donors (Si, S, Ge, Se, Sn, Te, and Pb) and nine acceptors (Be, Mg, Cr, Mn, Fe, Cu, Zn, Cd, and Hg) have been implanted into liquid‐encapsulated Czochralski InP(Fe). For each dopant, the first four moments of the density profile have been extracted by fitting Pearson IV distributions to secondary ion mass spectrometry data. The results suggest that, when implanting into indium phosphide at reduced energies not too far from 1, the mean will be 1/5 larger than the theoretical prediction and the standard deviation will be twice the theoretical prediction.

 

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