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Pyroelectric response andD*of thin pyroelectric films on a substrate

 

作者: A. van der Ziel,  

 

期刊: Journal of Applied Physics  (AIP Available online 1973)
卷期: Volume 44, issue 2  

页码: 546-549

 

ISSN:0021-8979

 

年代: 1973

 

DOI:10.1063/1.1662223

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The pyroelectric response and theD*of thin pyroelectric films on, a substrate are calculated as a function of the substrate and film thickness. It is found that for low‐frequency applications the pyroelectric layer should not be made too thin, preferably several micrometers thick, that the substrate should be as thin as possible, and that the product of its specific heat, density, and heat conductivity should be as small as possible. For thick substrates there is an intermediate frequency region where the value ofD*is practically independent of frequency. This intermediate frequency region extends to higher frequencies if the pyroelectric layer is made thinner, butD*decreases with decreasing film thickness in that region.

 

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