Experimental Aspects of Tunneling in Metal‐Semiconductor Barriers
作者:
J. W. Conley,
J. J. Tiemann,
期刊:
Journal of Applied Physics
(AIP Available online 1967)
卷期:
Volume 38,
issue 7
页码: 2880-2884
ISSN:0021-8979
年代: 1967
DOI:10.1063/1.1710017
出版商: AIP
数据来源: AIP
摘要:
The electrical characteristics of diodes made from degeneraten‐type Ge with either Au or In as the metallic element are reported. The results support a previously published calculation [Phys. Rev. 150, 466 (1966)]. It is significant that the observation can be interpreted quantitatively. Data are presented in terms of the dependence of incremental resistancedv/dior conductancedi/dvon applied voltage. Maxima in the incremental resistance predicted to occur at an applied voltage which corresponds to the Fermi degeneracy of then‐type Ge are observed. Data for several values of impurity, density, and temperature are shown to correspond quantitatively with the prediction. However, evidence suggests the importance of band tailing, a feature not included in the calculation. Observation of several additional effects is also reported. Pronounced structure near zero bias appears when the metallic element is in the superconducting state. This is well described by the BCS theory. The threshold for tunneling into the conduction‐band minimum &Ggr;2′was also observed. From this the separation in energy with respect to theL‐band minima is determined to be &Ggr;2′−L=0.154±0.003 eV. Anomalous structure at zero bias similar to that observed by others inp‐njunctions and metal‐oxide‐metal structures is reported but not interpreted.
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