Effect of SiH4/CH4flow ratio on the growth of &bgr;‐SiC on Si by electron cyclotron resonance chemical vapor deposition at 500 °C
作者:
Chih‐Chien Liu,
Chiapyng Lee,
Kuan‐Lun Cheng,
Huang‐Chung Cheng,
Tri‐Rung Yew,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 66,
issue 2
页码: 168-170
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.113552
出版商: AIP
数据来源: AIP
摘要:
&bgr;‐SiC (3C–SiC) films were deposited on silicon substrates by electron cyclotron resonance chemical vapor deposition from SiH4/CH4/H2mixtures at 500 °C. The crystalline structure and chemical composition of the deposited film were found to depend on the SiH4/CH4flow ratio. With a sufficient energy supply from microwave power and a SiH4/CH4flow ratio of 0.5 and lower, stoichiometric SiC could be deposited on Si substrates. Microcrystalline &bgr;‐SiC was grown at a SiH4/CH4flow ratio of 0.5, whereas amorphous SiC was obtained at the SiH4/CH4flow ratios lower than 0.5. When the SiH4/CH4flow ratio was above 0.5, only polycrystalline Si could be deposited. ©1995 American Institute of Physics.
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