Photochemical deposition of Sn for use in molecular beam epitaxy of GaAs
作者:
Steven P. Kowalczyk,
D. L. Miller,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena
(AIP Available online 1985)
卷期:
Volume 3,
issue 5
页码: 1534-1538
ISSN:0734-211X
年代: 1985
DOI:10.1116/1.582980
出版商: American Vacuum Society
关键词: PHOTOCHEMISTRY;TIN COMPOUNDS;MOLECULAR BEAM EPITAXY;TIN;GALLIUM ARSENIDES;ADSORPTION;DESORPTION;CV CHARACTERISTIC;SIMS;DOPED MATERIALS;CRYSTAL DOPING;PHOTOLYSIS;SORPTIVE PROPERTIES;ULTRAVIOLET RADIATION;DECOMPOSITION;DEPOSITION;Sn;GaAs
数据来源: AIP
摘要:
The suitability of several Sn‐containing molecules (tetramethyltin, tetrabutyltin, dibutyltin dibromide, and stannic chloride) as gas phase sources of Sn for use in molecular beam epitaxy of GaAs was evaluated.InsituAuger electron spectroscopy showed that the Sn molecules absorbed at approximately the monolayer level at room temperature on GaAs (001) epilayer surfaces and pyrolytically decomposed before desorption. Capacitance–voltage and secondary ion mass spectrometry profiles demonstrated that the pyrolytic Sn deposits incorporated as ann‐type dopant into newly regrown GaAs epilayers. Sn films were ultraviolet (UV) photolytically deposited on GaAs from each of these Sn‐containing molecules and characterized by x‐ray photoelectron spectroscopy.
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