首页   按字顺浏览 期刊浏览 卷期浏览 Photochemical deposition of Sn for use in molecular beam epitaxy of GaAs
Photochemical deposition of Sn for use in molecular beam epitaxy of GaAs

 

作者: Steven P. Kowalczyk,   D. L. Miller,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  (AIP Available online 1985)
卷期: Volume 3, issue 5  

页码: 1534-1538

 

ISSN:0734-211X

 

年代: 1985

 

DOI:10.1116/1.582980

 

出版商: American Vacuum Society

 

关键词: PHOTOCHEMISTRY;TIN COMPOUNDS;MOLECULAR BEAM EPITAXY;TIN;GALLIUM ARSENIDES;ADSORPTION;DESORPTION;CV CHARACTERISTIC;SIMS;DOPED MATERIALS;CRYSTAL DOPING;PHOTOLYSIS;SORPTIVE PROPERTIES;ULTRAVIOLET RADIATION;DECOMPOSITION;DEPOSITION;Sn;GaAs

 

数据来源: AIP

 

摘要:

The suitability of several Sn‐containing molecules (tetramethyltin, tetrabutyltin, dibutyltin dibromide, and stannic chloride) as gas phase sources of Sn for use in molecular beam epitaxy of GaAs was evaluated.InsituAuger electron spectroscopy showed that the Sn molecules absorbed at approximately the monolayer level at room temperature on GaAs (001) epilayer surfaces and pyrolytically decomposed before desorption. Capacitance–voltage and secondary ion mass spectrometry profiles demonstrated that the pyrolytic Sn deposits incorporated as ann‐type dopant into newly regrown GaAs epilayers. Sn films were ultraviolet (UV) photolytically deposited on GaAs from each of these Sn‐containing molecules and characterized by x‐ray photoelectron spectroscopy.

 

点击下载:  PDF (370KB)



返 回