Lattice expansion of Ca and Ar ion implanted GaN
作者:
C. Liu,
B. Mensching,
K. Volz,
B. Rauschenbach,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 71,
issue 16
页码: 2313-2315
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.120059
出版商: AIP
数据来源: AIP
摘要:
The 180 keVCa+andAr+ions were homogeneously implanted in GaN at temperature of liquid nitrogen. High resolution x-ray diffraction was used to monitor the change of GaN (0002) peak with the dose ranging from5×1012to1×1016 cm−2. It has been found that with increasing dose a new peak beside the GaN (0002) peak appears, grows up, and gradually shrinks until disappearance with arising of the amorphous peak, accompanied with a shift towards smaller angles. The difference betweenCa+andAr+implantation is discussed. Expansion of GaN crystal lattice due toCa+andAr+implantation accounts for this phenomenon and is confirmed by TEM results. ©1997 American Institute of Physics.
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