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Lattice expansion of Ca and Ar ion implanted GaN

 

作者: C. Liu,   B. Mensching,   K. Volz,   B. Rauschenbach,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 71, issue 16  

页码: 2313-2315

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.120059

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The 180 keVCa+andAr+ions were homogeneously implanted in GaN at temperature of liquid nitrogen. High resolution x-ray diffraction was used to monitor the change of GaN (0002) peak with the dose ranging from5×1012to1×1016 cm−2. It has been found that with increasing dose a new peak beside the GaN (0002) peak appears, grows up, and gradually shrinks until disappearance with arising of the amorphous peak, accompanied with a shift towards smaller angles. The difference betweenCa+andAr+implantation is discussed. Expansion of GaN crystal lattice due toCa+andAr+implantation accounts for this phenomenon and is confirmed by TEM results. ©1997 American Institute of Physics.

 

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