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High‐resolution deposition rate monitor

 

作者: Y. M. Jiang,   J.‐P. Torre,   K. Wang,   F. Pesty,   P. Garoche,  

 

期刊: Review of Scientific Instruments  （AIP Available online 1993）
卷期: Volume 64, issue 1  

页码: 247-249

 

ISSN:0034-6748

 

年代: 1993

 

DOI:10.1063/1.1144445

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A 16‐MHz piezoelectric quartz resonator has been used to build up a high‐resolution deposition rate monitor. A direct counting allows a resolution of 1 ng/cm2at a rate of one reading per second. Direct computer interface and increase in the voltage excitation above the plasma noise level have been successfully used to monitor the deposition rate in a dc sputtering apparatus.

 

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