作者: I. Abdulhalim,
期刊: Journal of Applied Physics (AIP Available online 1995) 卷期: Volume 77, issue 5
页码: 1897-1901
ISSN:0021-8979
年代: 1995
DOI:10.1063/1.358820
出版商: AIP
数据来源: AIP
摘要:
A microscopic many‐body model is proposed for the kinetics of metastable defects (MSDs) in hydrogenated amorphous silicon (a‐Si:H). It is based on the existence of short‐lived large energy fluctuations which induce transient traps for carriers that release their energy and enhance the creation or annihilation of MSDs. The expressions found for the photoinduced and thermally induced creation and annihilation rates’ coefficients explain the dependence on the variety of parameters. ©1995 American Institute of Physics.
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