Characteristics of infrared photodetectors produced by radiation doping
作者:
Chris Gross,
Robert J. Mattauch,
Thomas J. Viola,
期刊:
Journal of Applied Physics
(AIP Available online 1973)
卷期:
Volume 44,
issue 2
页码: 735-739
ISSN:0021-8979
年代: 1973
DOI:10.1063/1.1662254
出版商: AIP
数据来源: AIP
摘要:
High‐energy electrons (≈7 MeV) were used to radiation dope extrinsic silicon. Bothn‐ andp‐type silicon photodetectors were fabricated using this doping technique. The 500°K blackbody responsivity, spectral response, and peak detectivity were determined for these devices. The peak detectivity values measured were 4.8×1011cm Hz1/2W−1at 2.15 &mgr; for 0.1‐&OHgr; cmn‐type devices and 3.7×1011cm Hz1/2W−1at 40 &mgr; for 10‐&OHgr; cmp‐type detectors. A comparison of the thermally generated background majority carrier concentration for radiation‐doped and conventional impurity‐doped detectors is made.
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