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Characteristics of infrared photodetectors produced by radiation doping

 

作者: Chris Gross,   Robert J. Mattauch,   Thomas J. Viola,  

 

期刊: Journal of Applied Physics  (AIP Available online 1973)
卷期: Volume 44, issue 2  

页码: 735-739

 

ISSN:0021-8979

 

年代: 1973

 

DOI:10.1063/1.1662254

 

出版商: AIP

 

数据来源: AIP

 

摘要:

High‐energy electrons (≈7 MeV) were used to radiation dope extrinsic silicon. Bothn‐ andp‐type silicon photodetectors were fabricated using this doping technique. The 500°K blackbody responsivity, spectral response, and peak detectivity were determined for these devices. The peak detectivity values measured were 4.8×1011cm Hz1/2W−1at 2.15 &mgr; for 0.1‐&OHgr; cmn‐type devices and 3.7×1011cm Hz1/2W−1at 40 &mgr; for 10‐&OHgr; cmp‐type detectors. A comparison of the thermally generated background majority carrier concentration for radiation‐doped and conventional impurity‐doped detectors is made.

 

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