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Effects of implantation in rutile with metallic ions

 

作者: M. Guermazi,   P. Thevenard,   J.P. Dupin,   C.H. S. Dupuy,  

 

期刊: Radiation Effects  （Taylor Available online 1980）
卷期: Volume 49, issue 1-3  

页码: 61-64

 

ISSN:0033-7579

 

年代: 1980

 

DOI:10.1080/00337578008243068

 

出版商: Taylor & Francis Group

 

数据来源: Taylor

 

摘要:

Rutile single crystals (TiO2) have been implanted with heavy metallic particles in the energy range 0.3 MeV, 56 MeV. Optical measurements have been performed during implantation. Conductivity and Rutherford backscattering measurements have been made on as-implanted samples and after thermal treatments.

 

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