首页   按字顺浏览 期刊浏览 卷期浏览 Discharge stability in E‐beam‐sustained rare‐gas halide lasers
Discharge stability in E‐beam‐sustained rare‐gas halide lasers

 

作者: W. H. Long,  

 

期刊: Journal of Applied Physics  (AIP Available online 1979)
卷期: Volume 50, issue 1  

页码: 168-172

 

ISSN:0021-8979

 

年代: 1979

 

DOI:10.1063/1.325685

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The stability of a glow discharge in rare‐gas mixtures containing a small fraction of attaching species is examined, using the e‐beam‐sustained KrF laser discharge as a generic example. The stability limit is shown to lie near the peak of the voltage‐current characteristic, while the mode of instability is dependent on external circuit parameters. The calculated maximum discharge voltage is in good agreement with experimental observation over a wide range of e‐beam current densities.

 

点击下载:  PDF (343KB)



返 回