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Tribological characteristics of amorphous carbon films investigated by point contact microscopy

 

作者: T. Miyamoto,   R. Kaneko,   S. Miyake,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  (AIP Available online 1991)
卷期: Volume 9, issue 2  

页码: 1336-1339

 

ISSN:1071-1023

 

年代: 1991

 

DOI:10.1116/1.585191

 

出版商: American Vacuum Society

 

关键词: CARBON;FILMS;AMORPHOUS STATE;FLUORINATION;SILICON;TRIBOLOGY;POINT CONTACTS;MICROSCOPY;PHOTOELECTRON SPECTROSCOPY;X RADIATION;SILICON CARBIDES;CARBON FLUORIDES;C

 

数据来源: AIP

 

摘要:

Wear marks and frictional force distribution on amorphous carbon films, fluorinated amorphous carbon films, silicon‐containing amorphous carbon films, and fluorinated silicon‐containing amorphous carbon films were investigated by point contact microscopy. Film surfaces were also analyzed by x‐ray photoelectron spectroscopy. The fluorinated silicon‐containing (40%) amorphous carbon film has the highest strength of the tested films. CF4plasma treatment fluorinated the silicon‐containing (40%) amorphous carbon film, and significantly reduced its frictional coefficient to less than 0.3. The surface of fluorinated silicon‐containing (40%) amorphous carbon film is composed of carbon, silicon, fluorine, and oxygen. Carbon, silicon, and fluorine show the plural chemical states of SiC and CFx. This increases film strength and enhances the lubricating effect of the fluorinated silicon‐containing (40%) amorphous carbon film.

 

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