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Trapping mechanisms in device‐quality molecular beam epitaxial AlxGa1−xAs and GaAs–AlxGa1−xAs modulation doped heterostructures

 

作者: S. Dhar,   W. P. Hong,   P. K. Bhattacharya,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena  (AIP Available online 1986)
卷期: Volume 4, issue 2  

页码: 546-549

 

ISSN:0734-211X

 

年代: 1986

 

DOI:10.1116/1.583426

 

出版商: American Vacuum Society

 

关键词: TRAPPING;HETEROSTRUCTURES;GALLIUM ARSENIDES;ALUMINIUM ARSENIDES;DLTS;DEEP ENERGY LEVELS;IMPURITY STATES;ACTIVATION ENERGY;TRANSIENTS;IONIZATION;PHOTOIONIZATION;CRYSTAL DOPING;(Al,Ga)As;GaAs

 

数据来源: AIP

 

摘要:

The dominant electron trap D‐X center in AlxGa1−xAs has been clearly identified by us to consist of two closely related levels with thermal activation energies of 0.48 and 0.52 eV. Photoionization properties of the two levels have been explicitly measured by us for the first time. A new model for capacitance transients from modulation doped (MD) structures, which takes into account the heterointerface capacitance, is presented to explain the observed anomalous behavior of trap emission in MD structures. Both the thermal and the optical ionization properties of the two D‐X centers in MD structures are measured and discussed.

 

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