首页   按字顺浏览 期刊浏览 卷期浏览 Radiative recombination in near‐surface strained Si1−xGex/Si quantum wells
Radiative recombination in near‐surface strained Si1−xGex/Si quantum wells

 

作者: S. Fukatsu,   H. Akiyama,   Y. Shiraki,   H. Sakaki,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 67, issue 24  

页码: 3602-3604

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.115331

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Influence of the surface on the radiative recombination is studied in near‐surface (NS) strained Si1−xGex/Si quantum wells (QWs). The luminescence intensity of NSQWs is clearly diminished as the Si cap thickness decreases due to carrier capture to the surface. However, the luminescence diminution discloses a saturable behavior with increasing excitation density. Time‐resolved measurements reveal selective electron capture to surface traps as being the controlling process in the luminescence attenuation, and there is no signature of quantum mechanical hole tunneling to the surface. Results of potential‐biased luminescence lend further support to the electron‐controlled picture of the luminescence attenuation in Si‐based near‐surface geometry. ©1995 American Institute of Physics.

 

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