Preparation and characterization of thin, well‐ordered aluminum oxynitride films on NiAl(001)
作者:
F. Bartolucci,
G. Schmitz,
P. Gassmann,
R. Franchy,
期刊:
Journal of Applied Physics
(AIP Available online 1996)
卷期:
Volume 80,
issue 11
页码: 6467-6473
ISSN:0021-8979
年代: 1996
DOI:10.1063/1.363666
出版商: AIP
数据来源: AIP
摘要:
We deal with the formation of thin aluminum oxynitride (AlON) layers after adsorption of nitric oxide (or coadsorption of oxygen and ammonia) on NiAl(001) at 75 K and subsequent annealing at 1200 K. The adsorption of NO and formation of the AlON films are investigated by means of high‐resolution electron energy loss spectroscopy (HREELS), low‐energy electron diffraction (LEED), and Auger electron spectroscopy (AES). The AlON film shows a distinct (2×1) LEED pattern and the HREEL spectrum exhibits five loss peaks. An oxygen to nitrogen atomic ratio of &bartil;2 has been estimated from the AES analysis. The energy gap is determined to beEg=6.6±0.2 eV. The structure of &thgr;‐AlON is derived from that of &thgr;‐Al2O3. ©1996 American Institute of Physics.
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