Theoretical specific resistance of ohmic contacts ton‐GaAs
作者:
Jae S. Yoo,
Hong H. Lee,
期刊:
Journal of Applied Physics
(AIP Available online 1990)
卷期:
Volume 68,
issue 9
页码: 4903-4905
ISSN:0021-8979
年代: 1990
DOI:10.1063/1.346126
出版商: AIP
数据来源: AIP
摘要:
An improved version of a prior model is given for specific resistance of ohmic contacts ton‐GaAs. Instead of the two‐band model used in the prior work for the transmission coefficient, a more rigorous three‐band model due to E. O. Kane [J. Phys. Chem. Solids1, 249 (1957)] is used in the improved version. In the doping range of interest, the theoretical contact resistance can differ by more than an order of magnitude, particularly at high intrinsic barrier heights. The contact resistance is given as a function of doping and the intrinsic barrier height. An ultimate limit to the contact resistance is also given.
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