Metalorganic chemical vapor deposition of ferroelectric Pb(Zr,Ti)O3thin films
作者:
Tadashi Shiosaki,
Masaru Shimizu,
期刊:
Integrated Ferroelectrics
(Taylor Available online 1995)
卷期:
Volume 9,
issue 1-3
页码: 13-20
ISSN:1058-4587
年代: 1995
DOI:10.1080/10584589508012901
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
The controllability of PZT film properties and the possibility of the scaling up the MOCVD to the commercial based production were briefly reviewed. The film composition and crystalline phase of the PZT films were easily controlled using the MOCVD process. The electrical properties were also controlled by changing the growth parameters. A low processing temperature was achieved using a new Pb precursor, tryethyl n-pentoxy lead. Large area growth of PZT and PLZT films on a 6–8 inch wafer was also achieved.
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