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Ambient dependence of metal diffusion through a less‐electronegative metal layer

 

作者: Chin‐An Chang,   Helen L. Yeh,  

 

期刊: Applied Physics Letters  (AIP Available online 1986)
卷期: Volume 49, issue 19  

页码: 1233-1235

 

ISSN:0003-6951

 

年代: 1986

 

DOI:10.1063/1.97423

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The diffusion of metals through a less‐electronegative metal layer is studied for its dependence on ambient gases. When the diffusion is essentially one directional with little interdiffusion, the observed ambient dependence is in agreement with that described by the surface potential model proposed earlier. An enhanced diffusion is expected when the ambient increases the work function of the less‐electronegative metal through which the diffusion of the more‐electronegative one is studied. This has been observed for the diffusion of Au and Cu across the intermediate Ni layer in the Au/Ni/Cu structure under both oxygen and hydrogen, and for the outdiffusion of Cu through Ni in the Ni/Cu structure by oxygen.

 

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