Performance of tantalum‐silicon‐nitride diffusion barriers between copper and silicon dioxide
作者:
M. S. Angyal,
Y. Shacham‐Diamand,
J. S. Reid,
M.‐A. Nicolet,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 67,
issue 15
页码: 2152-2154
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.114750
出版商: AIP
数据来源: AIP
摘要:
Amorphous, 10‐nm‐thick tantalum‐silicon‐nitride (TaSiN) layers were found to be effective diffusion barriers between copper and thermal silicon dioxide. The films were electrically evaluated using TaSiN/Cu/TaSiN‐oxide‐silicon capacitors and bias thermal stress (BTS) treatments; the capacitors were stressed at 300 °C with electric fields in excess of 1 MV/cm for up to 80 h. High frequency capacitance versus voltage characteristics were recorded at room temperature before and after BTS treatment. Based upon comparisons between these (C–V) curves, barrier failure was concluded to have not occurred. ©1995 American Institute of Physics.
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