A new analytical technique of photoluminescence for optimization of organometallic chemical vapor deposition
作者:
J. K. Hsu,
S. H. Jones,
K. M. Lau,
期刊:
Journal of Applied Physics
(AIP Available online 1986)
卷期:
Volume 60,
issue 10
页码: 3781-3784
ISSN:0021-8979
年代: 1986
DOI:10.1063/1.337543
出版商: AIP
数据来源: AIP
摘要:
An analytical method for quantitative interpretation of GaAs photoluminescence spectra was developed. Because of various transition mechanisms the photoluminescence spectrum of a sample may vary significantly under different measurement conditions. Based on a proposed scheme of transition priorities, spectra taken at various excitation powers were analyzed. Comparing results of undoped GaAs epitaxial layers grown by organometallic chemical vapor deposition under similar conditions but different V/III ratios, an optimum ratio corresponding to a minimum number of shallow impurities was clearly identified. Carbon and zinc were found to be the major shallow acceptors in most samples. At very low V/III ratios, carbon was the most dominant acceptor. The carbon concentration diminishes with an increasing ratio and the amount of zinc becomes more significant.
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