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Variable axis lens for electron beams

 

作者: H. C. Pfeiffer,   G. O. Langner,   M. Sturans,  

 

期刊: Applied Physics Letters  （AIP Available online 1981）
卷期: Volume 39, issue 9  

页码: 775-776

 

ISSN:0003-6951

 

年代: 1981

 

DOI:10.1063/1.92851

 

出版商: AIP

 

数据来源: AIP

 

摘要:

An electron optical focusing and deflection system for electron beam lithography has been developed which eliminates off‐axis aberrations up to the third order including transverse chromatic errors by means of a variable axis lens (VAL). Feasibility of the VAL concept has been established experimentally.

 

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