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Registration of soft x radiation in As2S3layers

 

作者: E. Spassova,   G. Danev,   P. Guttmann,  

 

期刊: Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena  （AIP Available online 1991）
卷期: Volume 9, issue 4  

页码: 1939-1943

 

ISSN:1071-1023

 

年代: 1991

 

DOI:10.1116/1.585384

 

出版商: American Vacuum Society

 

关键词: ARSENIC SULFIDES;VAPOR DEPOSITED COATINGS;SOFT X RADIATION;PHOTOGRAPHY;PHOTOSENSITIVITY;LITHOGRAPHY

 

数据来源: AIP

 

摘要:

The photographic behavior of unsensitized evaporated layers of As2S3exposed by x rays in the spectral region of 2–7 nm is studied. The photographic sensitivity is found to be 500–600 mJ/cm2and the limits of photographic treatment are determined. It is concluded that the layers could be discussed as promising material for x‐ray microlithography.

 

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