Langmuir probe analysis of distributed electron cyclotron resonance silicon nitride deposition plasma
作者:
F. Delmotte,
M. C. Hugon,
B. Agius,
A. M. Pointu,
S. Teodoru,
期刊:
Applied Physics Letters
(AIP Available online 1998)
卷期:
Volume 72,
issue 12
页码: 1448-1450
ISSN:0003-6951
年代: 1998
DOI:10.1063/1.120608
出版商: AIP
数据来源: AIP
摘要:
Single and double Langmuir probe analyses have been realized in the wafer region of an electron cyclotron resonance reactor in its distributed configuration. Results in nitrogen gas have shown unambiguously that two electron populations exist in this region: one with low temperature (about 1–2eV) and high density and the second with higher temperature (about 8 eV) and lower density. Measurements in silicon nitride deposition plasma (nitrogen and silane gases) have been successfully realized and have shown that these two populations are also present. Finally, we try to correlate the plasma parameters (electron temperatures and densities and ions’ energy) to the deposited film parameters (deposition rate and refractive index). ©1998 American Institute of Physics.
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