Effect of incorporated nitrogen on the kinetics of thin rapid thermal N2O oxides
作者:
M. L. Green,
D. Brasen,
L. C. Feldman,
W. Lennard,
H.‐T. Tang,
期刊:
Applied Physics Letters
(AIP Available online 1995)
卷期:
Volume 67,
issue 11
页码: 1600-1602
ISSN:0003-6951
年代: 1995
DOI:10.1063/1.114952
出版商: AIP
数据来源: AIP
摘要:
We have grown ∼10 nm O2and N2O‐oxides on Si(100) by RTO (rapid thermal oxidation) over the temperature range 800–1200 °C. Although the growth rates of both oxides exhibit Arrhenius behavior over the entire temperature range, the N2O‐oxides exhibit a large change in the Arrhenius preexponential factor for oxidation temperatures greater than 1000 °C. Above this temperature, N2O‐oxides grow a factor of 5 slower than O2oxides. Below this temperature, N2O‐oxide growth rates approach those of O2‐oxides. This growth rate inflection can be explained in terms of N incorporation, which increases with increasing oxidation temperature. The equivalent of one monolayer of N coverage is achieved at about 1000 °C, coincident with the inflection. The incorporated N retards the linear growth of the thin N2O‐oxides either by occupying oxidation reaction sites or inhibiting transport of oxidant species to the vicinity of the interface. ©1995 American Institute of Physics.
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