We have combined computer simulations and atomic-resolution tunneling microscopy to investigate the kinetics of defect migration during annealing of ion implanted Si(111)-7×7. Using atomically-clean and flat surfaces as sinks for bulk point defects introduced by the irradiation, we observe distinct, temperature-dependent surface arrival rates for vacancies and interstitials, and we demonstrate that the distinct kinetics of each type of bulk point defect govern their surface segregation kinetics. A combination of simulation tools provides a detailed description of the processes that underlie the observed temperature-dependence of defect migration. ©1997 American Institute of Physics.