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Surface reaction of trisdimethylaminoarsenic onGaAs(001)-c(4×4)and(4×6)

 

作者: Jie Cui,   Masashi Ozeki,   Masafumi Ohashi,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 71, issue 18  

页码: 2659-2661

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.120170

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The surface decomposition of trisdimethylaminoarsenic (TDMAAs) on GaAs (001) has been studied employing supersonic molecular beam scattering. It was found that TDMAAs molecules adsorbed dissociatively on GaAs (001) surfaces at room temperature through a Langmuir adsorption mechanism. The initial Ga-rich(4×6)surface changed into an As-richc(4×4)surface after the injection of TDMAAs. The species such as dimethylamine and methylmethyleneimine desorbed at the surface temperatures of 150 and 230 °C, respectively, as measured by temperature-programmed desorption (TPD) spectra. The polar-angle dependence of desorption showed that the desorption of species has two maximal intensities, at the directions along surface normal and 60°, respectively. ©1997 American Institute of Physics.

 

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