Effect of&agr;-HgI2epitaxial growth on the defect structure of CdTe:Ge substrates
作者:
G. Panin,
J. Piqueras,
N. Sochinskii,
E. Dieguez,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 70,
issue 7
页码: 877-879
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.118237
出版商: AIP
数据来源: AIP
摘要:
The&agr;-HgI2/CdTe:Geheterostructures have been studied by cathodoluminescence (CL) in the scanning electron microscope. The&agr;-HgI2expitaxial growth was shown to cause an enhancement of the CL intensity in a layer of the substrate extending up to about 500 &mgr;m from the&agr;-HgI2/CdTe:Geinterface. CL spectra of the layer reveal the appearance of a band related to tellurium vacancies as well as the decrease of the emission attributed to defect complexes involving Ge. The data obtained indicate that Ge-impurity gettering andVTegeneration at the interface take place during&agr;-HgI2epitaxial growth. ©1997 American Institute of Physics.
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