首页   按字顺浏览 期刊浏览 卷期浏览 Effect of&agr;-HgI2epitaxial growth on the defect structure of CdTe:Ge substrates
Effect of&agr;-HgI2epitaxial growth on the defect structure of CdTe:Ge substrates

 

作者: G. Panin,   J. Piqueras,   N. Sochinskii,   E. Dieguez,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 70, issue 7  

页码: 877-879

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.118237

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The&agr;-HgI2/CdTe:Geheterostructures have been studied by cathodoluminescence (CL) in the scanning electron microscope. The&agr;-HgI2expitaxial growth was shown to cause an enhancement of the CL intensity in a layer of the substrate extending up to about 500 &mgr;m from the&agr;-HgI2/CdTe:Geinterface. CL spectra of the layer reveal the appearance of a band related to tellurium vacancies as well as the decrease of the emission attributed to defect complexes involving Ge. The data obtained indicate that Ge-impurity gettering andVTegeneration at the interface take place during&agr;-HgI2epitaxial growth. ©1997 American Institute of Physics.

 

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