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Quasistatic and nonequilibrium phenomena in m.o.s. structures under the influence of a constant gate-current bias

 

作者: P.G.C.Allman,   J.G.Simmons,  

 

期刊: IEE Proceedings I (Solid-State and Electron Devices)  (IET Available online 1980)
卷期: Volume 127, issue 3  

页码: 140-146

 

年代: 1980

 

DOI:10.1049/ip-i-1.1980.0027

 

出版商: IEE

 

数据来源: IET

 

摘要:

The quasistatic and nonequilibrium response of an m.o.s. system containing bulk traps under constant gate-current conditions is analysed. It is shown that a particular advantage of the method is that the total semiconductor capacitance can be extracted directly from the curves, thus easing the analysis of quasistatic results for obtaining interface state density. For a specific range of operating conditions the resulting nonequilibrium characteristic is rich in structure, which allows for analysis of the bulk properties of the semiconductor.

 

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