首页   按字顺浏览 期刊浏览 卷期浏览 Large photoluminescence enhancements from epitaxial GaAs passivated by postgrowth phosp...
Large photoluminescence enhancements from epitaxial GaAs passivated by postgrowth phosphidization

 

作者: D. A. Harrison,   R. Are`s,   S. P. Watkins,   M. L. W. Thewalt,   C. R. Bolognesi,   D. J. S. Beckett,   A. J. SpringThorpe,  

 

期刊: Applied Physics Letters  (AIP Available online 1997)
卷期: Volume 70, issue 24  

页码: 3275-3277

 

ISSN:0003-6951

 

年代: 1997

 

DOI:10.1063/1.118426

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Dramatic enhancements of over300×in the room temperature photoluminescence signal obtained from high purity GaAs epitaxial layers were recorded after a brief heat treatment in tertiarybutylphosphine vapor. Low temperature photoluminescence spectra indicate that, unlike other passivation techniques, the surface layer formed during this simple treatment does not induce any appreciable strain on the underlying epilayer. The increases in photoluminescence intensity are indicative of a reduction in surface recombination brought about by the formation of a very thin GaP layer that protects against surface oxidation. ©1997 American Institute of Physics.

 

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