Reaction of atomic and molecular bromine with aluminum
作者:
A. Landauer Keaton,
D. W. Hess,
期刊:
Journal of Applied Physics
(AIP Available online 1988)
卷期:
Volume 63,
issue 2
页码: 533-539
ISSN:0021-8979
年代: 1988
DOI:10.1063/1.340083
出版商: AIP
数据来源: AIP
摘要:
Bromine atom concentrations in Br2discharges were measured by Br2absorption spectroscopy. At 3.7 MHz, the dissociation of Br2increased with power, reaching a maximum of ∼40%. The aluminum etch rate was proportional to the bromine atom concentration. In the discharge, atoms etched aluminum 20 times faster than molecules. The etch product molecule appears to be reversibly physisorbed on the brominated surface with an apparent binding energy of ∼0.2 eV/molecule.
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