Atmospheric pressure organometallic vapor phase epitaxy growth of high‐mobility GaAs using trimethylgallium and arsine
作者:
M. C. Hanna,
Z. H. Lu,
E. G. Oh,
E. Mao,
A. Majerfeld,
期刊:
Applied Physics Letters
(AIP Available online 1990)
卷期:
Volume 57,
issue 11
页码: 1120-1122
ISSN:0003-6951
年代: 1990
DOI:10.1063/1.103509
出版商: AIP
数据来源: AIP
摘要:
Epitaxial layers of GaAs with peak mobilities as high as 200 000 cm2/V s at 50 K have been grown in an atmospheric pressure organometallic vapor phase epitaxy reactor using trimethylgallium (TMG) and arsine. The growth conditions which lead to high‐mobility GaAs are described in this letter. Low‐temperature photoluminescence and temperature‐dependent Hall measurements are used to study the dependence of the incorporation of residual impurities on the growth temperature and arsine partial pressure. Carbon acceptor densities <1014cm−3were measured in the highest purity samples.
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