The removal of hydrocarbons and silicone grease stains from silicon wafers
作者:
Robert Sherman,
Walter Whitlock,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics Processing and Phenomena
(AIP Available online 1990)
卷期:
Volume 8,
issue 3
页码: 563-567
ISSN:0734-211X
年代: 1990
DOI:10.1116/1.585010
出版商: American Vacuum Society
关键词: WAFERS;SILICON;SILICONES;GREASES;NOZZLES;JETS;SURFACE ANALYSIS;SURFACE CONTAMINATION;SURFACE CLEANING;Si
数据来源: AIP
摘要:
A relatively new method of removing hydrocarbon and silicone grease stains from silicon wafer surfaces is discussed. In this technique, high purity liquid or gaseous CO2is expanded in a special nozzle to form a high speed jet. The jet contains numerous small diameter particles of solid CO2. The CO2particles, referred to as snow, strike the surface and remove adherent particles (even submicron sizes), hydrocarbon stains such as fingerprints and noseprints, and silicone grease. Indeed, CO2snow cleaning of clean wafer surfaces has led to sizable reductions in the adventitious hydrocarbons; in one case, the reduction was about 60%. Surface analysis of clean and contaminated silicon wafers indicates that CO2snow cleaning causes no apparent chemical interactions and leaves no detectable residues.
点击下载:
PDF
(309KB)
返 回