Topographical changes induced by low energy ion beam sputtering at oblique incidence
作者:
Ren Cong-xin,
Chen Guo-Ming,
Fu Xtn-Ding,
Yang Jie,
Fang Hong-Li,
Tsou Shih-Chang,
期刊:
Radiation Effects
(Taylor Available online 1983)
卷期:
Volume 77,
issue 3-4
页码: 177-193
ISSN:0033-7579
年代: 1983
DOI:10.1080/00337578308228185
出版商: Taylor & Francis Group
数据来源: Taylor
摘要:
When niechanically polished Ge, Si, GaAs, LiNbOj, Cd-Ga-garnet, fused quartz and glass surfaces are sputtered by low energy ion beam (from 300 to 1200 eV) at an incident angle of 45°, the surfaces are found to exhibit hillock-like features. The influence of ion beam incident angle, energy, dose and target rotation on surface topography have been investigated. The analysesof hillocks by SIMS and AES show that their formation may not be due to impurity contamination caused by redeposition. A mechanism for hillock formation is proposed. This can be expressed by aformula, through which all the results can be successfully explained.
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