Electroluminescence and photoluminescence ofGe+-implantedSiO2films thermally grown on crystalline silicon
作者:
Jia-Yu Zhang,
Xing-Long Wu,
Xi-Mao Bao,
期刊:
Applied Physics Letters
(AIP Available online 1997)
卷期:
Volume 71,
issue 17
页码: 2505-2507
ISSN:0003-6951
年代: 1997
DOI:10.1063/1.120102
出版商: AIP
数据来源: AIP
摘要:
Electroluminescent devices have been fabricated based onGe+-implantedSiO2films thermally grown on crystalline silicon. Both room-temperature electroluminescence and photoluminescence spectra are found to have three luminescent bands peaked at 3.1, 2.1, and 1.6 eV. The electroluminescent devices have onsets for emission under forward bias of 5 V and under reverse bias of−13 V.Its emission is stable and reproducible. Spectral analyses suggest that the electroluminescent excitation of the 3.1 eV band may be related to the impact ionization by hot electrons, whereas that of the 2.1 and 1.6 eV bands to the radiative recombination of hole-electron pairs. ©1997 American Institute of Physics.
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