Transparent conductive coatings of In1.9Sn0.1O3have been made on fused silica which exhibit damage thresholds of 2.2 and 3.1 J/cm2for 0.15‐ and 1‐nsec Nd : glass laser pulses, respectively. The coatings were made by reactive sputtering in an rf diode system. Coating absorption detected spectrophotometrically was less than 1% (∼300 cm−1) near 1064 nm for coatings with in‐plane resistivities of 0.017 and 0.55 &OHgr; cm. An important potential application for such coatings is as the electrode for electro‐optic shutters based on the longitudinal Pockels effect which are used in high‐energy laser systems.