首页   按字顺浏览 期刊浏览 卷期浏览 Low‐frequency admittance measurements on the HgCdTe/Photox SiO2interface
Low‐frequency admittance measurements on the HgCdTe/Photox SiO2interface

 

作者: G. H. Tsau,   A. Sher,   M. Madou,   J. A. Wilson,   V. A. Cotton,   C. E. Jones,  

 

期刊: Journal of Applied Physics  (AIP Available online 1986)
卷期: Volume 59, issue 4  

页码: 1238-1244

 

ISSN:0021-8979

 

年代: 1986

 

DOI:10.1063/1.336511

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The complex admittance of ann‐type Hg1−xCdxTe/Photox SiO2interface withx=0.3 has been examined for frequencies ranging between 1 mHz and 4 MHz. The conductance method is used to decompose the total interface state density into three types of components: a valence‐band tail, a conduction‐band tail, and some well‐resolved discrete states. The fixed charge density is low and there is no statistical broadening. The surface valence‐ and conduction‐band edges are both found to be shifted upward in energy relative to their respective bulk values; moreover, the surface has converted toptype. The energy variation of the valence‐band tail states response times follows a pattern characteristic of Shockley–Read recombination centers with a constant capture cross section, but the behavior of the conduction‐band tail states is more complicated. Evidence is presented that the interface region has a higher Cd concentration than the bulk.

 

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