首页   按字顺浏览 期刊浏览 卷期浏览 Electroluminescence and photoluminescence of Ge‐implanted Si/SiO2/Si structures
Electroluminescence and photoluminescence of Ge‐implanted Si/SiO2/Si structures

 

作者: K. V. Shcheglov,   C. M. Yang,   K. J. Vahala,   Harry A. Atwater,  

 

期刊: Applied Physics Letters  (AIP Available online 1995)
卷期: Volume 66, issue 6  

页码: 745-747

 

ISSN:0003-6951

 

年代: 1995

 

DOI:10.1063/1.114080

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Electroluminescent devices were fabricated in SiO2films containing Ge nanocrystals formed by ion implantation and precipitation during annealing at 900 °C, and the visible room‐temperature electroluminescence and photoluminescence spectra were found to be broadly similar. The electroluminescent devices have an onset for emission in reverse bias of approximately −10 V, suggesting that the mechanism for carrier excitation may be an avalanche breakdown caused by injection of hot carriers into the oxide. The electroluminescent emission was stable for periods exceeding 6 h. ©1995 American Institute of Physics.

 

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