Interface instability in an electric field
作者:
L. Klinger,
L. Levin,
期刊:
Journal of Applied Physics
(AIP Available online 1995)
卷期:
Volume 78,
issue 3
页码: 1669-1672
ISSN:0021-8979
年代: 1995
DOI:10.1063/1.360262
出版商: AIP
数据来源: AIP
摘要:
We have studied morphological changes of an interface in a strong electric field which is normal to the initially planar interface. Electromigration along the interface in a two phase metallic systemA‐Bof the immiscible components has been considered. The stresses arising during electromigration of the components were taken into account. A nonlinear equation has been derived for the interface evolution in the electric field, allowing for curvature of the interface. It was shown that the interface diffusion in an electric field leads to the formation of a periodic corrugation on the interface if the components are distinguished by their electric charges. The corrugation increases with time and is transformed into a channel‐hillock‐like structure. The nonlinear equation was analyzed numerically for the steady‐state case. The shape and the growth rate of hillocks on the interface have been calculated. ©1995 American Institute of Physics.
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