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Electrical Characteristics of Sputter‐Ion Pumps

 

作者: Kenneth B. Wear,  

 

期刊: Journal of Applied Physics  (AIP Available online 1967)
卷期: Volume 38, issue 4  

页码: 1936-1940

 

ISSN:0021-8979

 

年代: 1967

 

DOI:10.1063/1.1709785

 

出版商: AIP

 

数据来源: AIP

 

摘要:

Ultra‐high vacuum pumps of the sputter‐ion pattern have been investigated from the standpoint of origin and destination of electrically charged particles constituting pump current. It has been found that secondary electron emission is responsible for a large portion of total current, that ion energies range from 0.50 to 0.80 of applied pump potential, and that needle crystals (whiskers) that grow progressively from pump electrodes cause pump current to depart from its linear dependence on pressure.

 

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