Optical emission spectroscopy of high density metal plasma formed during magnetron sputtering
作者:
Z. J. Radzimski,
O. E. Hankins,
J. J. Cuomo,
W. P. Posadowski,
S. Shingubara,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1997)
卷期:
Volume 15,
issue 2
页码: 202-208
ISSN:1071-1023
年代: 1997
DOI:10.1116/1.589265
出版商: American Vacuum Society
关键词: Cu
数据来源: AIP
摘要:
The operation of a high power density magnetron source during sputtering of a copper target both in standard mode with argon as well as in self-sputtering mode without argon is discussed. Voltage–current characteristics of the source and light emission spectra were taken for various conditions of magnetron operation to understand the transition from standard to self-sputtering mode. A qualitative explanation of the ionization mechanism is offered based on the effect of electron temperature and density on the Maxwellian distribution of electron energy.
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