Suppression of thermal donor formation in heavily dopedn‐type silicon
作者:
Kazumi Wada,
Naohisa Inoue,
期刊:
Journal of Applied Physics
(AIP Available online 1985)
卷期:
Volume 57,
issue 12
页码: 5145-5147
ISSN:0021-8979
年代: 1985
DOI:10.1063/1.335248
出版商: AIP
数据来源: AIP
摘要:
It is found by deep level transient spectroscopy (DLTS) that the oxygen thermal donor formation is suppressed in Czochralski silicon doped with donor impurities more than 1×1016cm−3. The result is explained by a new model considering electron‐hole equilibrium. The dopant concentration dependence of the thermal donor formation is analyzed, based on the model, and it is concluded that the thermal donor is a doubly charged donor.
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