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Suppression of thermal donor formation in heavily dopedn‐type silicon

 

作者: Kazumi Wada,   Naohisa Inoue,  

 

期刊: Journal of Applied Physics  (AIP Available online 1985)
卷期: Volume 57, issue 12  

页码: 5145-5147

 

ISSN:0021-8979

 

年代: 1985

 

DOI:10.1063/1.335248

 

出版商: AIP

 

数据来源: AIP

 

摘要:

It is found by deep level transient spectroscopy (DLTS) that the oxygen thermal donor formation is suppressed in Czochralski silicon doped with donor impurities more than 1×1016cm−3. The result is explained by a new model considering electron‐hole equilibrium. The dopant concentration dependence of the thermal donor formation is analyzed, based on the model, and it is concluded that the thermal donor is a doubly charged donor.

 

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