首页   按字顺浏览 期刊浏览 卷期浏览 Capture‐emission process in double Poole–Frenkel well traps: Theory and ex...
Capture‐emission process in double Poole–Frenkel well traps: Theory and experiments

 

作者: C. Y. Chang,   W. C. Hsu,   S. J. Wang,   S. S. Hau,  

 

期刊: Journal of Applied Physics  (AIP Available online 1986)
卷期: Volume 60, issue 3  

页码: 1042-1045

 

ISSN:0021-8979

 

年代: 1986

 

DOI:10.1063/1.337395

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The field‐dependent capture‐emission process has been studied for double Poole–Frenkel well traps compared with that of single Poole–Frenkel well trap. The emission rate increases with increasing field strength for a single trap. However, for a double trap, it increases to a maximum then decreases with further increasing field due to the barrier lowering and interstate interactions between these two wells. Experimental capacitance deep‐level transient spectroscopic data of GaAs samples grown by molecular‐beam epitaxy show that when there is a delay in the capacitance transient then there always appear two levels, namely, 0.4 and 0.5 eV. In addition, for both levels, the emission rate increases first to a maximum and then decreases with increasing electric field.

 

点击下载:  PDF (325KB)



返 回