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Serial cosputtering of some metal alloys: Enhancement of partial sputtering yields of light metals

 

作者: A. Belkind,   Z. Orban,   S. Berg,   P. Carlsson,  

 

期刊: Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films  （AIP Available online 1993）
卷期: Volume 11, issue 2  

页码: 314-318

 

ISSN:0734-2101

 

年代: 1993

 

DOI:10.1116/1.578731

 

出版商: American Vacuum Society

 

关键词: SPUTTERING;MAGNETRONS;OVERLAYERS;ALUMINIUM ALLOYS;TUNGSTEN ALLOYS;TITANIUM ALLOYS;ZIRCONIUM ALLOYS;CHEMICAL COMPOSITION;BINARY ALLOYS;(Al,W);(Al,Zr);(Ti,W)

 

数据来源: AIP

 

摘要:

We describe serial cosputtering of Al/W, Ti/W, and Al/Zr metal alloys. Overcoating Al and Ti targets with the heavier metals Zr and W enhances the partial sputtering yield of the host metals. Computer modeling of sputtering from a bilayer structure using a modifiedt‐dynprogram indicates mixing of the two elements at the interface that takes place because of recoil implantation. In certain cases, such mixing can lead to the enhancement of the partial sputtering yield of the ground‐layer element.    

 

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