首页   按字顺浏览 期刊浏览 卷期浏览 Copper exchange plating on palladium and its relation to circuit repair
Copper exchange plating on palladium and its relation to circuit repair

 

作者: R. J. von Gutfeld,   D. R. Vigliotti,   R. E. Acosta,  

 

期刊: Applied Physics Letters  (AIP Available online 1991)
卷期: Volume 59, issue 26  

页码: 3490-3492

 

ISSN:0003-6951

 

年代: 1991

 

DOI:10.1063/1.105663

 

出版商: AIP

 

数据来源: AIP

 

摘要:

We describe a series of experiments using local heating to deposit copper from solution onto a palladium pattern. We show that palladium, the more noble metal, does not dissolve during thermally induced exchange plating when sacrificial copper is appropriately placed with respect to the palladium. Rather, the palladium becomes cathodic locally without dissolution, consistent with its position in the electronegativity series. However, without sacrificial copper, no deposition occurs. These results help to explain the mechanisms for a recently described electrochemical ‘‘open’’ microcircuit repair method.

 

点击下载:  PDF (446KB)



返 回