Optimization studies on magnetic field geometry for planar magnetron sputtering targets
作者:
G. Mohan Rao,
S. Mohan,
期刊:
Journal of Vacuum Science&Technology A: Vacuum, Surfaces, and Films
(AIP Available online 1991)
卷期:
Volume 9,
issue 6
页码: 3100-3104
ISSN:0734-2101
年代: 1991
DOI:10.1116/1.577179
出版商: American Vacuum Society
关键词: MAGNETRONS;SPUTTERING;TARGETS;MAGNETIC FIELD CONFIGURATIONS;EFFICIENCY;DESIGN
数据来源: AIP
摘要:
The present study deals with the design aspects of planar magnetron sputtering targets. A permanent ring magnet with modified pole piece geometry has been used for maximum ionization efficiency. The efficiency of electron containment on the target surface has been evaluated in terms of current at the electrically isolated substrates. The details of the relation between the magnetic field strength and field geometry on the ionization currents and operating pressure have been discussed. The best among the designs studied, when operated at a pressure of 8×10−3Torr resulted in a deposition rate of about 2000 Å/min at a current density of 4 mA/cm2. The substrate temperature rise was about 20 °C under these conditions. The design details of the magnetrons, experimentation for evaluating the electron containment have been discussed in this article.
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