Visualization of plasma uniformity in dry etching using the imaging plate
作者:
Kiyoshi Arita,
Masahiro Etoh,
Tanemasa Asano,
期刊:
Journal of Vacuum Science&Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
(AIP Available online 1998)
卷期:
Volume 16,
issue 2
页码: 519-522
ISSN:1071-1023
年代: 1998
DOI:10.1116/1.589855
出版商: American Vacuum Society
数据来源: AIP
摘要:
Monitoring two-dimensional plasma uniformity in dry etching process by using the imaging plate has been investigated. It was found that the distribution of photostimulated-luminescence intensity of the imaging plate correlates well with the distribution of the ion density in the plasma measured with a Langmuir probe. The effect of ultraviolet light from the plasma has been investigated by covering the imaging plate with a quartz wafer. It was found that the imaging plate senses ultraviolet light from the plasma whose intensity is correlated with the ion density in the bulk plasma.
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