首页   按字顺浏览 期刊浏览 卷期浏览 Vidicon target of ap‐i‐nstructure usinga‐Si:H
Vidicon target of ap‐i‐nstructure usinga‐Si:H

 

作者: Isamu Shimizu,   Shunri Oda,   Keishi Saito,   Eiichi Inoue,  

 

期刊: Journal of Applied Physics  （AIP Available online 1980）
卷期: Volume 51, issue 12  

页码: 6422-6423

 

ISSN:0021-8979

 

年代: 1980

 

DOI:10.1063/1.327591

 

出版商: AIP

 

数据来源: AIP

 

摘要:

A vidicon target of ap‐i‐nstructure has been fabricated using amorphous silicon prepared by a rf glow discharge of silane (SiH4). A thin layer ofn‐typea‐silicon doped with phosphorus was provided between a photosensitive layer and a substrate coated with a transparent electrode (SnO2:Sb) to prohibit injection of holes. An excellent photoresponse was attained for visible light.

 

点击下载:  PDF (153KB)



返 回