首页   按字顺浏览 期刊浏览 卷期浏览 Photoluminescence of shallow acceptors in epitaxial AlxGa1−xAs
Photoluminescence of shallow acceptors in epitaxial AlxGa1−xAs

 

作者: G. B. Stringfellow,   R. Linnebach,  

 

期刊: Journal of Applied Physics  (AIP Available online 1980)
卷期: Volume 51, issue 4  

页码: 2212-2217

 

ISSN:0021-8979

 

年代: 1980

 

DOI:10.1063/1.327844

 

出版商: AIP

 

数据来源: AIP

 

摘要:

The low‐temperature (2 K) photoluminescence (PL) of AlxGa1−xAs (0<x<0.25 was studied in an effort to characterize shallow acceptors in material grown by organometallic vapor phase epitaxy and liquid phase epitaxy techniques. The dominant shallow acceptor in nominally undoped AlxGa1−xAs specimens grown by both techniques was identified as Carbon, withEA=26 meV forx=0.EAwas observed to increase with increasingxto ∼36 meV atx∼0.20, as expected for an effective mass like center whereEA∝[m*(x)/&egr;(x)2]. The PL peak due to the conduction band to acceptor transition was found to become progressively broader with increasingx, which is attributed to increasing donor plus acceptor concentration. The acceptor Ge was studied in intentionally doped LPE specimens. It also behaves as a simple effective masslike center, withEGe∼40 meV for GaAs and 55 meV for Al0.2Ga0.8As, contrary to earlier reports of anomalous behavior.

 

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